Cryogenic characterization of titanium nitride thin films

Titanium Nitride Thin Films by the Electron Shower Process

Titanium nitride (TiN), a stable compound with the NaCl structure, has a wide range of properties which find applications in cutting tools, wear resistant parts, semiconductor metallization, and the jewelry industry. However, there are problems with preparing highly adhesive thin films which maintain good properties. Thin films of titanium nitride have been prepared by the Electron Shower (ES) ...

Preparation and Characterization of Aluminum Nitride Thin Films with the Potential Application in Electro-Acoustic Devices

In this work, aluminum nitride (AlN) thin films with different thicknesses were deposited on quartz and  silicon  substrates  using  single  ion  beam  sputtering  technique.  The  physical  and  chemical properties  of  prepared  films  were  investigated  by  different  characterization  technique.  X-ray diffraction (XRD) spectra revealed that all of the deposited films have an amorphous str...

Investigation of resistive switching in anodized titanium dioxide thin films

In this work, TiO2 nanostructures were grown on titanium thin films by electrochemical anodizing method. The bipolar resistive switching effect has been observed in Pt/TiO2/Ti device. Resistive switching characteristics indicated the TiO2 nanotubes are one of the potential materials for nonvolatile memory applications.  Increasing anodizing duration will increase nanotube lengths which itself c...

Nanocharacterization of titanium nitride thin films obtained by reactive magnetron sputtering

Titanium nitride thin films are used in applications such as tribological layers for cutting tools, coating of some medical devices (scalpel blades, prosthesis, implants etc.), sensors, electrodes for bioelectronics, microelectronics, diffusion barrier, bio-microelectromechanical systems (Bio-MEMS) and so on. This work is a comparative study concerning the influence of substrate temperature on ...

Structure and mechanical properties of titanium nitride thin films grown by reac - tive pulsed laser deposition